Publication Beamlines Strategic Pillar
Zonghua PU; Gaixia Zhang; Shuhui Sun (2023). Single-atom catalysts and method of manufacture thereof. Patent Number: US20230366111A1. HXMA, SGM Materials
Zonghua PU; Gaixia Zhang; Shuhui Sun (2023). Single-atom catalysts and method of manufacture thereof. Patent Number: US20230366111A1. HXMA, SGM Materials
Zhu Chen; Edward Sargent; David Sinton (2024). Processes and systems for the selective electrochemical reduction of co2 in acidic conditions, cathodes and catalysts used in the same. Patent Number: WO2024084288A2. CLS-APS Materials
Yuhang Wang; Edward Sargent (2020). Electrocatalysts synthesized under co2 electroreduction and related methods and uses. Patent Number: WO2020225315A1. HXMA Materials
Yuanjun CHEN; Pengfei OU; Edward H. Sargent (2025). Processes and systems for the electrochemical reduction of carbon monoxide and/or carbon dioxide, cathodes and catalysts used in the same. Patent Number: WO2025012703A1. SXRMB Materials
Yang Shao-Horn; Yuriy Roman; Jiayu Peng (2024). Transition metal nitrides as solid carriers for ammonia storage. Patent Number: US11958752B2. REIXS Materials
Yang Shao-Horn; Yuriy ROMAN; Denis Kuznetsov; Livia Giordano; Jiayu PENG et al. (2019). Perovskites for catalyzing oxygen evolution. Patent Number: WO2019245929A1. REIXS Materials
Xueliang Sun; Xiaona Li; Jianwen LIANG; Changhong Wang; Huan Huang et al. (2024). Solid electrolyte material for lithium secondary battery, electrode, and battery. Patent Number: EP4371942A2. HXMA Materials
Weihan NI; Yongxiang Liang; Zhu Chen; Edward H. Sargent (2025). Techniques for favoring carbon oxides electroreduction into ethylene. Patent Number: WO2025027390A2. SXRMB Materials
Venu Varanasi; Pranesh Aswath; Philip Kramer; Megen Velten; Azhar Ilyas et al. (2020). Si—O—N—P related fabrication methods, surface treatments and uses thereof. Patent Number: US10828393B2. SGM, SXRMB, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Philip Kramer; Megen Velten; Azhar Ilyas et al. (2020). Si—O—N—P related fabrication methods, surface treatments and uses thereof. Patent Number: US10828393B2. SGM, SXRMB, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Philip Kramer; Megen Velten; Azhar Ilyas et al. (2020). Si—O—N—P related fabrication methods, surface treatments and uses thereof. Patent Number: US10828393B2. SGM, SXRMB, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Megen Maginot; Nickolay V. Lavrick (2021). Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof. Patent Number: US10898618B2. SGM, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Megen Maginot; Nickolay V. Lavrick (2021). Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof. Patent Number: US10898618B2. SGM, VLS-PGM Materials
Thomas SPRETER VON KREUDENSTEIN; Surjit Bhimarao Dixit; Paula Irene Lario; Eric Escobar-Cabrera; Martin J. BOULANGER et al. (2023). Crystal structures of heterodimeric fc domains. Patent Number: CA2889951C. CMCF-BM Health