Publication Beamlines Strategic Pillar
Achenbach, Sven; Wells, Garth; Jacobs, Michael; Moazed, Banafsheh; Iyer, Swathi et al. (2018). Polymer-based X-ray masks patterned by direct laser writing. Review of Scientific Instruments 89(11) , 115001. 10.1063/1.5041916. SYLMAND Materials
Achenbach, S.; Hengsbach, S.; Schulz, J.; Mohr, J. (2018). Optimization of laser writer-based UV lithography with high magnification optics to pattern X-ray lithography mask templates. Microsystem Technologies 25(8) . 10.1007/s00542-018-4161-2. SYLMAND Materials
Zanyk, Noah (2026). Development and Characterization of a Fabrication Process for X-Ray Lithography Masks Based on a Silicon Nitride Membrane. Supervisor: Achenbach, Sven. Saskatchewan, Canada: University of Saskatchewan. https://hdl.handle.net/10388/19217. SYLMAND Materials