Publication Beamlines Strategic Pillar
Min-Jae Choi; Francisco Pelayo GARCIA DE ARQUER; Sjoerd HOOGLAND; Edward H. Sargent (2021). Cascade surface modification of colloidal quantum dot inks enables efficient bulk homojunction photovoltaics. Patent Number: US20210301141A1. HXMA Materials
Qi Liu; He Zhu (2024). Nickel-rich layered oxide cathode materials for Li ion batteries. Patent Number: US11942638B2. CLS-APS, SGM Materials
Qi Liu; He Zhu (2024). Nickel-rich layered oxide cathode materials for Li ion batteries. Patent Number: US11942638B2. CLS-APS, SGM Materials
Rashidian, Atabak; Klymyshyn, David; Aligodarz, Mohammadreza Tayfeh; Achenbach, Sven Carsten; Börner, Martin Wilfried et al. (2019). Polymer-based resonator antennas. Patent Number: US10361487B2. SYLMAND Materials
Sarbajit Banerjee; Justin L. Andrews (2024). Synthesis of a metastable vanadium pentoxide as a cathode material for ion batteries. Patent Number: US20240282947A1. SM Materials
Sarbajit Banerjee; Justin L. Andrews; Abhishek Parija; Luis R. De Jesus Baez (2025). Electrochemical storage incorporating size- and morphology-controlled metastable vanadium pentoxide as a cathode material for ion batteries. Patent Number: US20250125347A1. REIXS, SM Materials
Sarbajit Banerjee; Justin L. Andrews; Abhishek Parija; Luis R. De Jesus Baez (2025). Electrochemical storage incorporating size- and morphology-controlled metastable vanadium pentoxide as a cathode material for ion batteries. Patent Number: US20250125347A1. REIXS, SM Materials
Taotao ZHUANG; Alexander IP; Edward Sargent (2020). Metal nanoparticle electrocatlysts with confinement cavity morphology for improved selectivity. Patent Number: WO2020056507A1. HXMA Materials
Venu Varanasi; Pranesh Aswath; Megen Maginot; Nickolay V. Lavrick (2021). Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof. Patent Number: US10898618B2. SGM, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Megen Maginot; Nickolay V. Lavrick (2016). Amorphous Silicon Oxide, Amorphous Silicon Oxynitride, and Amorphous Silicon Nitride Thin Films and Uses Thereof. Patent Number: US20160067387A1. SGM, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Megen Maginot; Nickolay V. Lavrick (2021). Amorphous silicon oxide, amorphous silicon oxynitride, and amorphous silicon nitride thin films and uses thereof. Patent Number: US10898618B2. SGM, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Megen Maginot; Nickolay V. Lavrick (2016). Amorphous Silicon Oxide, Amorphous Silicon Oxynitride, and Amorphous Silicon Nitride Thin Films and Uses Thereof. Patent Number: US20160067387A1. SGM, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Philip Kramer; Megen Velten; Azhar Ilyas et al. (2020). Si—O—N—P related fabrication methods, surface treatments and uses thereof. Patent Number: US10828393B2. SGM, SXRMB, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Philip Kramer; Megen Velten; Azhar Ilyas et al. (2020). Si—O—N—P related fabrication methods, surface treatments and uses thereof. Patent Number: US10828393B2. SGM, SXRMB, VLS-PGM Materials
Venu Varanasi; Pranesh Aswath; Philip Kramer; Megen Velten; Azhar Ilyas et al. (2020). Si—O—N—P related fabrication methods, surface treatments and uses thereof. Patent Number: US10828393B2. SGM, SXRMB, VLS-PGM Materials