Publication Beamlines Strategic Pillar
Proppe, Andrew H.; Johnston, Andrew; Teale, Sam; Mahata, Arup; Quintero-Bermudez, Rafael et al. (2021). Multication perovskite 2D/3D interfaces form via progressive dimensional reduction. Nature Communications 12(1) . 10.1038/s41467-021-23616-9. BXDS, BXDS-WLE, HXMA Materials
Pravica, Michael; Sneed, Daniel; Wang, Yonggang; Smith, Quinlan; White, Melanie et al. (2016). Hexafluorobenzene under Extreme Conditions. Journal of Physical Chemistry B 120(10) . 10.1021/acs.jpcb.6b00497. MID-IR Materials
Pravica, Michael; Sneed, Daniel; Wang, Yonggang; Smith, Quinlan; Subrahmanyam, Garimella et al. (2014). Carbon tetrachloride under extreme conditions. Journal of Chemical Physics 140(19) , 194503. 10.1063/1.4876220. MID-IR Materials
Pravica, Michael; Sneed, Daniel; Smith, Quinlan; Billinghurst, Brant; May, Tim et al. (2016). A novel synthesis of polymeric CO via useful hard X-ray photochemistry. Cogent Physics 3(1) , 1169880. 10.1080/23311940.2016.1169880. FAR-IR, MID-IR Materials
Pravica, Michael; Sneed, Daniel; Smith, Quinlan; Billinghurst, Brant; May, Tim et al. (2016). A novel synthesis of polymeric CO via useful hard X-ray photochemistry. Cogent Physics 3(1) , 1169880. 10.1080/23311940.2016.1169880. FAR-IR, MID-IR Materials
Pravica, Michael G.; Schyck, Sarah; Harris, Blake; Cifligu, Petrika; Kim, Eunja et al. (2019). Fluorine chemistry at extreme conditions: Possible synthesis of $HgF_4$. Papers in Physics 11, 110001. 10.4279/pip.110001. FAR-IR Materials
Pravica, Michael; Evlyukhin, Egor; Cifligu, Petrika; Harris, Blake; Jae Koh, Jung et al. (2017). X-ray induced synthesis of a novel material: Stable, doped solid CO at ambient conditions. Chemical Physics Letters 686, 183-188. 10.1016/j.cplett.2017.08.053. FAR-IR, HXMA, MID-IR Materials
Pravica, Michael; Evlyukhin, Egor; Cifligu, Petrika; Harris, Blake; Jae Koh, Jung et al. (2017). X-ray induced synthesis of a novel material: Stable, doped solid CO at ambient conditions. Chemical Physics Letters 686, 183-188. 10.1016/j.cplett.2017.08.053. FAR-IR, HXMA, MID-IR Materials