Publication Beamlines Strategic Pillar
Achenbach, S.; Hengsbach, S.; Schulz, J.; Mohr, J. (2018). Optimization of laser writer-based UV lithography with high magnification optics to pattern X-ray lithography mask templates. Microsystem Technologies 25(8) . 10.1007/s00542-018-4161-2. SYLMAND Materials
Achenbach, S.; Haluzan, D. T.; Klymyshyn, D. M.; Börner, M.; Mohr, J. et al. (2013). Large tuning ratio high aspect ratio variable capacitors using leveraged bending. Microsystem Technologies 20(10-11) , 1807-1813. 10.1007/s00542-013-1940-7. SYLMAND